Atomic layer deposition
Picosun R200 in Uppsala
The Picosun R200 is an ALD system with documented oxide and nitride deposition processes. Its public description includes plasma and ozone processing options. For a proposed project, the useful comparison is the match between your target film, substrate and permitted process, rather than the model name alone. Access requires confirmation.
- Manufacturer
- Picosun
- Model
- R200
- Technique
- Atomic layer deposition
- Location
- Uppsala, Sweden
Questions to clarify for your project
- Which film and substrate combination are you investigating?
- Is your process thermal, plasma-assisted or ozone-based?
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