Abstract

Electron beam lithography

NanoBeam Ltd. nB5 in Uppsala

The NanoBeam nB5 is documented for electron-beam patterning of chips and wafers. The facility describes CAD-based job preparation and several substrate-holder options. Researchers should establish how the design will be prepared and how the sample will be mounted before comparing exposure approaches or planning an experiment.

Manufacturer
NanoBeam Ltd.
Model
nB5
Technique
Electron beam lithography
Location
Uppsala, Sweden

Questions to clarify for your project

  • Which CAD format and exposure pattern will you supply?
  • Does the substrate need a standard or specially approved holder?

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NanoBeam Ltd. nB5 in Uppsala | Abstract