Atomic layer deposition
Microchemistry F120 in Uppsala
The Microchemistry F120 is documented for depositing metal oxide and sulfide films. It is a relevant starting point for research that needs controlled thin-film growth rather than bulk coating. The source marks access as restricted, so a listing does not establish that a new project can use the instrument.
- Manufacturer
- Microchemistry
- Model
- F120
- Technique
- Atomic layer deposition
- Location
- Uppsala, Sweden
Questions to clarify for your project
- Which film composition and substrate do you need?
- Does the facility accept your project and material combination?
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