Mask alignment and photolithography
Karl Süss MA6 / BA6 in Uppsala
The Karl Süss MA6/BA6 is documented for contact lithography and wafer-bond alignment, including backside alignment. The appropriate setup depends on the substrate and the alignment task. Discuss the mask, resist and mounting requirements with the facility before assuming that a particular process can be accommodated.
- Manufacturer
- Karl Süss
- Model
- MA6 / BA6
- Technique
- Mask alignment and photolithography
- Location
- Uppsala, Sweden
Questions to clarify for your project
- Is the task frontside exposure, backside alignment or bond alignment?
- What mask and substrate combination are you planning?
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