Electron beam lithography
JEOL Ltd. JBX-8100FS in Uppsala
The JEOL JBX-8100FS is documented as an electron beam lithography system for semiconductor nanofabrication. The source distinguishes precision-oriented and throughput-oriented operation. A research inquiry should explain the pattern, substrate and alignment needs so the facility can discuss the suitable writing approach and preparation requirements.
- Manufacturer
- JEOL Ltd.
- Model
- JBX-8100FS
- Technique
- Electron beam lithography
- Location
- Uppsala, Sweden
Questions to clarify for your project
- What pattern density and alignment requirements does the design have?
- Which substrate and resist will be used?
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